In a sputterion pump employing a high vapor pressure electrode. Hydrogen pumping by sputterion pumps and getter pumps. The use of a sputter ion source to generate a negative tritium ion beam for a tandem accelerator was suggested in 1977 by yiddletonl and the technique vas used at the university of pennsylvania in 1977 for a run of about 700 hours duration2. Silver as a removable coating for scanning electron. Normally both the target and substrate should sputter. A sputter ion pump currently used was developed and completed in the nineteen seventies and the exhaust region of the pump was about 103 pa to 109 pa in those days. Virtually all of the major innovations have come from varian, from the first diode vacion pump to the triode, then to the starcell series pumps, and the vacion plus. Capture gas ions when the positive ion strikes the cathode plate, that impact is called sputtering. Ion pump an ion pump is a vacuum pump, where the pumped out gas is subjected to extensive ionization, and the positively charged ions that are.
When the pump was used to attain ultrahigh vacuum condition, the sputter ion pump was used in combination with a rotary vacuum pump or an absorption pump. An ion pump ionizes gas within the vessel it is attached to and employs a strong electrical potential, typically 37 kv, which allows the ions to accelerate into and be. It is used as a pretreatment product for nonconductive samples to improve imaging resolution, sample conductivity, electron charge reduction and reduce beam damage to sensitive samples. Ulvacs acter pumps were developed to enable single sputter ion pumps to create ultrahigh vacuum on the order of 1010 pa. Nonconductive samples need a nanothin coating to prevent electron charging and improve imaging.
Moreover, pumping speed measurements and ultimate pressure data, obtained after a relatively short bake. A nonlinear analytical model for the pressure dynamics in a vacuum chamber, pumped with a sputter ion pump sip, is proposed, discussed. They are designed for developing new elements acter elements with improved evacuation characteristics at ultrahigh and extremely high vacuum, and. An ion pump ionizes gas within the vessel it is attached to and employs a strong electrical potential, typically 3kv to 7kv, which allows the ions to accelerate into and be captured by a. This involves ejecting material from a target that is a source onto a substrate such as a silicon wafer. Application of compact negsputter ion pump combination in uhv system of hiaf. Ion pumps are shipped under vacuum to ensure ultra high vacuum cleanliness and to demonstrate the vacuum integrity of the ion pump. Hydrogen pumping speeds in sputterion pumps are particularly dependent upon operating conditions. At gamma vacuum, we have grown to be an industry leading ion pump. Ion pumpnoble pump is an ultrahigh vacuum pump which utilizes the gas adsorption properties of the cathode material sputtered by cold cathode discharge within a magnetic field and the continuous formation of active getter film by sputtering cathode material ti during collision with the cathode. This can be overcome by making the target area small compared to the. The positive ion is forced out of the anode tube by the high voltage field at a high velocity toward the cathode plate. Study of plasma and ion beam sputtering processes 1 the conversion of neutral particles into ions, electrons plasma. The pumping effect of sputter ion pumps is produced by sorption processes, which are released by ionised gas particles.
Capacities are available up to 14,000 cu ft per minute, with an operating pressure range of 102 torr to below 1011 torr. The parts for the sputter ion pump were supplied by various companies. Titan ion pump brochure pdf, 629 kb digitel controller brochure pdf, 1. A conventional sputter ion pump comprises a vacuum envelope housing, at least one cathode electrode, an anode electrode formed as a plurality of hollow cylindrical cells, and means for applying to. Specifications of sputter ion pump power supplies s. This is a picture of the sputter ion pump parts, not the assembled sputter ion pump. Download pdf copy the spt20 is an easy to operate metal sputter coater offering the best value on the market for an automated coater.
Pdf application of compact negsputter ion pump combination in. Discover agilents ion pumps with neg cartridge, ion combineg pumps. The installation of a standard sputter ion pump inside the detectors to enhance the pumping is not possible due to the particle background that it would cause. Ion combineg pumps combine the stateoftheart agilent formerly varian ion pump with the saes nonevaporable getter neg cartridge. Magnet assembly for sputter ion pump perkins charles. A sputter ion pump consists basically of two electrodes, anode and cathode, and a magnet fig. The following paper outlines the working principles of sputterion pumps.
Sputter ion pump ion pump an ion pump is a type of vacuum pump capable of reaching pressures as low as 10. Always use high purity argon gas of the grade known as white spot this will ensure fast sputter rate and good pump down time. Various parameters, such as magnetic field, electrode voltage, operating pressure, pump history, electrode contamination and partial pressure of other gases are shown to have a major influence on the pumping speed for any given gas. His investigation about electronic vacuum pumping led in 1957 see fig. The sputter coater applies a nanothin layer of conductive metal thus allowing imaging at the maximum resolution and magnifications without the concern of electron charge effects. An ion pump also referred to as a sputter ion pump is a type of vacuum pump capable of reaching pressures as low as 10. Ion pump features and benefits 2 ion pump evolution since the late 1950s, when the ion pump was invented at varian, many changes and technical improvements have taken place. Ion pumps sputterion pumps, getterion pumps, penning pumps provide a clean, simple, low maintenance alternative for producing and maintaining high and ultrahigh vacuum. Connect the high voltage cable to an ion pump controller with.
The combination of the alarming production rate of methane from titanium. The long term pumping of argon is very stable with this element. Theory of operation gamma vacuum, everything ion pump. The sputterion pump combines mechanical, electrical, magnetic and chemical principles to permanently capture residual gas molecules in vacuum systems. Ideal solution for ultrahigh vacuum uhv applications. Optimized annular triode ion pump for experimental areas.
Pumping mechanisms in sputter ion pumps are quite different for different gasses, and as a consequences pumping speeds are different too. The pumping mechanisms for reactive and inert gas species, as well as argon instability. Operating principle of sputter ion pumps ions from a gas discharge impinge on the cathode of an electrode system within the pump housing thereby sputtering the cathode material titanium, in conventional pumps. Can operate at lower pressures while still sustaining a plasma. The mcm100 is an ion sputter coater for nonconductive samples. Record vessel pressure, and sputterion pump power supply voltage and current as a. Evacuate the sputter ion pump and the vacuum vessel to a pressure of less than 20 microns 2 x102 torr. Study of plasma and ion beam sputtering processes 129 of an ion source for a particular application should be made with due consideration of factors such as species and intensity capability, beam quality emittance and brightness, ionization efficiency, reliability,ease of operation, maintenance, and source lifetime. Resputtering is reemission of the deposited material during the deposition process by ion or atom bombardment. The generic name sputter ion pump or ion getter pump comes from the fact. An innovative sputter ion pump design, optimized for both pumping speed in ultra high vacuum and getter film sputtering, will be introduced. Due to the conductive nature of the titanium film, it is a good practice to eliminate line of sight from the tsp to the rest of the vacuum system. Ion pump sputter ion pump modion ion vacuum pumps by j.
Using the anode layer ion source from as an ion pump. A sputterion vacuum pump as described in claim 5 wherein the low vapor pressure diffusion means comprises bars of low pressure material placed on the high pressure electrode in the path of the ion discharge. The neg pump, coupled to a distributed sputterion pump sip mostly intended to pump residual argon and possibly methane constitutes the principal pumping system for the uhv regime, allowing routine operation in the low 1011 torr range. Optimization of sputter ion pumps 4 technology innovation in uhv 8 references11. Conclusion the approach described represents an improvement for supplying sputterion pumps. Valve off the roughing pump, and start the sputterion pump.
Keywords ion pump sputter ion pump keywords glossary of. Sputterion pump article about sputterion pump by the. The voltage applied to the pump was 5 kv, and a vacuum of about 2 x 10 mbar could be maintained for transfer periods between 1 and 2 h. Under ideal conditions, ion pumps are capable of reaching pressures as low as 10.
Record vessel pressure, and sputter ion pump power supply voltage and current as a. Rotary planetary specimen stages are essential for ensuring even coatings on specimens with irregular surfaces. An ion pump also referred to as a sputter ion pump is a type of vacuum pump which operates by sputtering a metal getter. Specification and manual downloads on are structured by. Use the supplied cable or a cable with the appropriate mating connector for your feedthrough. Routine production of a triton beam for an fn accelerator. Pumping mechanisms in sputterion pumps low pressure. A sputterion pump consists basically of two electrodes, anode and cathode, and a magnet fig. Valve off the roughing pump, and start the sputter ion pump. The careful choice of materials and optimization of structures are the main engineering criteria in the experimental areas.
Ion getter pumps also called sputter ion pumps or simply ion pumps produce. Rf plasmas tend to fill the chamber as opposed to dc plasmas which are confined to the cathode. In the sputter ion pump, residual gasses are ionized utilizing electric and magnetic fields. Background sputterion pumps sips are capture pumps. The hve model 860 negative sputter ion source is a heavy ion source which produces microampere intensity negative ion beams from a wide variety of elemental materials. Vacion plus 150 pumps instruction manual 87900 10201 e. The pumping effect is based chiefly on gettering processes. Evacuate the sputterion pump and the vacuum vessel to a pressure of less than 20 microns 2 x102 torr. Performance is superior in comparison to diode pumps with differential cathodes and in comparison to conventional triode pumps. Hydrogen in the pump walls and anodes limits the base pressure of the pump. Download fulltext pdf distributed sputterion pumps for use in low magnetic fields article pdf available in ieee transactions on nuclear science 263. The general requirements are a source of electrons, a small region. A detail treatment of the subject of capture pumps, including sips, is given else where.
Cathode materials are ejected toward the anode tube and the ion chemically and physically reacts with the cathode. Entrapment or capture vacuum pumps, which retain gas molecules by chemical or physical interaction on their internal surfaces. The full speed of the pump is developed in the pressure range from about 106 to 108 torr, although the. An ion pump is a type of vacuum pump which operates by sputtering a metal getter. The negative ions are produced by bombarding a cylindrical target of the desired beam material with positive cesium ions. Agilent celebrates the 60 year anniversary of the ion pump invention at varian associates by j. Other articles where sputter ion pump is discussed. Sputter deposition is a physical vapor deposition pvd method of thin film deposition by sputtering. A study has been performed to design a new sputter ion pump sip using adequate axisymmetric spindle magnetic field instead of dipole field, which reduces continuous loss of electrons plasma and confine them for longer time through magnetic mirror action. A portable power supply for sputterion pumps sciencedirect.
Sputtered atoms ejected from the target have a wide energy distribution. A sputter ion pump is a device for producing very high vacuum conditions. At high pressures of hydrogen, maximum speeds are obtained with the gas diffusing rapidly into the cathodes, but since the diffusion is sensitive to surface contamination, relatively low partial pressures of gases such as nitrogen can greatly reduce the speed. Sputter ion pumps are one type of pump used to create ultrahigh vacuum, and are used in many analyzers and accelerators. The experimental results suggest that the geometrical. An ion pump first ionizes gas within the vessel it is attached to and employs a strong electrical potential, typically 37 kv, which accelerates the ions into a solid electrode. In all types of ion sources, the gas ions are produced by various types of gas discharge including electron collisions with gas atoms. The pumping speed is achieved by parallel connection of many individual penning cells. The pumping effect of sputterion pumps is produced by sorption processes, which are released by ionised gas particles. Varian 2 ls vacion ion pump can be downloaded in pdf format to the side. View and download varian 9191115 instruction manual online.